Coverart for item
The Resource Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy

Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy

Label
Handbook of cleaning for semiconductor manufacturing : fundamentals and applications
Title
Handbook of cleaning for semiconductor manufacturing
Title remainder
fundamentals and applications
Statement of responsibility
Karen A. Reinhardt, Richard F. Reidy
Creator
Contributor
Subject
Language
eng
Summary
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This
Member of
Cataloging source
KNOVL
http://library.link/vocab/creatorName
Reinhardt, Karen A
Dewey number
621.38152
Illustrations
illustrations
Index
index present
LC call number
QC611.6.S9
LC item number
R456 2011eb
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
1960-
http://library.link/vocab/relatedWorkOrContributorName
Reidy, Richard F.
http://library.link/vocab/subjectName
  • Semiconductors
  • TECHNOLOGY & ENGINEERING
  • TECHNOLOGY & ENGINEERING
Label
Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt -- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski -- Aluminum Interconnect Cleaning and Drying / David J Maloney -- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank -- Wafer Reclaim / Michael B Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdils̈, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar
Control code
755804433
Dimensions
unknown
Extent
1 online resource (xxii, 590 pages)
Form of item
online
Isbn
9781118071748
Lccn
2011275120
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations
Specific material designation
remote
System control number
(OCoLC)755804433
Label
Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
multicolored
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt -- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski -- Aluminum Interconnect Cleaning and Drying / David J Maloney -- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank -- Wafer Reclaim / Michael B Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdils̈, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar
Control code
755804433
Dimensions
unknown
Extent
1 online resource (xxii, 590 pages)
Form of item
online
Isbn
9781118071748
Lccn
2011275120
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations
Specific material designation
remote
System control number
(OCoLC)755804433

Library Locations

    • Ellis LibraryBorrow it
      1020 Lowry Street, Columbia, MO, 65201, US
      38.944491 -92.326012
    • Engineering Library & Technology CommonsBorrow it
      W2001 Lafferre Hall, Columbia, MO, 65211, US
      38.946102 -92.330125
Processing Feedback ...