The Resource Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy
Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy
Resource Information
The item Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Missouri Libraries.This item is available to borrow from 2 library branches.
Resource Information
The item Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Missouri Libraries.
This item is available to borrow from 2 library branches.
- Summary
- This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This
- Language
- eng
- Extent
- 1 online resource (xxii, 590 pages)
- Contents
-
- Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman
- The Chemistry of Wet Cleaning / D Martin Knotter
- The Chemistry of Wet Etching / D Martin Knotter
- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella
- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt
- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant
- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt
- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski
- Aluminum Interconnect Cleaning and Drying / David J Maloney
- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot
- Corrosion and Passivation of Copper / Darryl W Peters
- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank
- Wafer Reclaim / Michael B Korzenski, Ping Jiang
- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdils̈, Daniel Delprat, Christophe Maleville
- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold
- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar
- Isbn
- 9781118071748
- Label
- Handbook of cleaning for semiconductor manufacturing : fundamentals and applications
- Title
- Handbook of cleaning for semiconductor manufacturing
- Title remainder
- fundamentals and applications
- Statement of responsibility
- Karen A. Reinhardt, Richard F. Reidy
- Language
- eng
- Summary
- This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This
- Cataloging source
- KNOVL
- http://library.link/vocab/creatorName
- Reinhardt, Karen A
- Dewey number
- 621.38152
- Illustrations
- illustrations
- Index
- index present
- LC call number
- QC611.6.S9
- LC item number
- R456 2011eb
- Literary form
- non fiction
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorDate
- 1960-
- http://library.link/vocab/relatedWorkOrContributorName
- Reidy, Richard F.
- http://library.link/vocab/subjectName
-
- Semiconductors
- TECHNOLOGY & ENGINEERING
- TECHNOLOGY & ENGINEERING
- Label
- Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy
- Bibliography note
- Includes bibliographical references and index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Color
- multicolored
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
- Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt -- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski -- Aluminum Interconnect Cleaning and Drying / David J Maloney -- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank -- Wafer Reclaim / Michael B Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdils̈, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar
- Control code
- 755804433
- Dimensions
- unknown
- Extent
- 1 online resource (xxii, 590 pages)
- Form of item
- online
- Isbn
- 9781118071748
- Lccn
- 2011275120
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations
- Specific material designation
- remote
- System control number
- (OCoLC)755804433
- Label
- Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy
- Bibliography note
- Includes bibliographical references and index
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Color
- multicolored
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
- Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D Martin Knotter -- The Chemistry of Wet Etching / D Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A Reinhardt, Richard F Reidy, John A Marsella -- Fundamental Design of Chemical Formulations / Robert J Rovito, Michael B Korzenski, Ping Jiang, Karen A Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T Pate, Donald C Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A Reinhardt -- High Dose Implant Stripping / Karen A Reinhardt, Michael B Korzenski -- Aluminum Interconnect Cleaning and Drying / David J Maloney -- Low-k/Cu Cleaning and Drying / Karen A Reinhardt, Richard F Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J Chabal, Martin M Frank -- Wafer Reclaim / Michael B Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C Le Tiec, Frank Fournel, Ludovic F L Ecarnot, Sebastien L E Kerdils̈, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M Sparks, Alain C Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A Marsella, Dana L Durham, Leslie D Molnar
- Control code
- 755804433
- Dimensions
- unknown
- Extent
- 1 online resource (xxii, 590 pages)
- Form of item
- online
- Isbn
- 9781118071748
- Lccn
- 2011275120
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations
- Specific material designation
- remote
- System control number
- (OCoLC)755804433
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.missouri.edu/portal/Handbook-of-cleaning-for-semiconductor/yNn0t1Tssk8/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.missouri.edu/portal/Handbook-of-cleaning-for-semiconductor/yNn0t1Tssk8/">Handbook of cleaning for semiconductor manufacturing : fundamentals and applications, Karen A. Reinhardt, Richard F. Reidy</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.missouri.edu/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.missouri.edu/">University of Missouri Libraries</a></span></span></span></span></div>
