The Resource Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films, Pierre A. Steinmann and Talivaldis Spalvins, (microform)

Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films, Pierre A. Steinmann and Talivaldis Spalvins, (microform)

Label
Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films
Title
Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films
Statement of responsibility
Pierre A. Steinmann and Talivaldis Spalvins
Creator
Contributor
Subject
Genre
Language
eng
Member of
Additional physical form
Also available via Internet from the NTRS web site. Address as of 3/23/06: http://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19900011894%5F1990011894.pdf; current access is available via PURL.
Cataloging source
PIT
http://library.link/vocab/creatorName
Steinmann, Pierre A
Government publication
federal national government publication
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Spalvins, Talivaldis
  • Lewis Research Center
  • United States
Series statement
NASA technical paper
Series volume
2994
http://library.link/vocab/subjectName
  • Coatings
  • Lubrication and lubricants
  • Molybdenum compounds
  • Sputtering (Physics)
  • Deposition
  • Lubricants
  • Magnetron sputtering
  • Morphology
  • Radio frequencies
  • Stoichiometry
  • Thin films
Label
Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films, Pierre A. Steinmann and Talivaldis Spalvins, (microform)
Instantiates
Publication
Note
  • Shipping list no.: 1990-0871-M
  • Distributed to depository libraries in microfiche
  • Prepared at Lewis Research Center
  • "April 1990."
Base of film
safety base undetermined
Bibliography note
Bibliography: page 3
Carrier category
microfiche
Carrier category code
  • he
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
34351177
Dimensions
28 cm
Dimensions
4x6 in. or 11x15 cm.
Emulsion on film
diazo
Extent
7 pages
Form of item
microfiche
Generation
service copy
Media category
microform
Media MARC source
rdamedia
Media type code
  • h
Other physical details
illustrations
http://library.link/vocab/ext/overdrive/overdriveId
n 90-21210
Positive negative aspect
negative
http://bibfra.me/vocab/marc/reductionRatio
02
ReductionRatioRange
normal reduction
Reproduction note
Microfiche.
Specific material designation
  • microfiche
  • remote
System control number
(GPO)99185830
Label
Influence of the deposition conditions on radiofrequency magnetron sputtered MoS2 films, Pierre A. Steinmann and Talivaldis Spalvins, (microform)
Publication
Note
  • Shipping list no.: 1990-0871-M
  • Distributed to depository libraries in microfiche
  • Prepared at Lewis Research Center
  • "April 1990."
Base of film
safety base undetermined
Bibliography note
Bibliography: page 3
Carrier category
microfiche
Carrier category code
  • he
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
34351177
Dimensions
28 cm
Dimensions
4x6 in. or 11x15 cm.
Emulsion on film
diazo
Extent
7 pages
Form of item
microfiche
Generation
service copy
Media category
microform
Media MARC source
rdamedia
Media type code
  • h
Other physical details
illustrations
http://library.link/vocab/ext/overdrive/overdriveId
n 90-21210
Positive negative aspect
negative
http://bibfra.me/vocab/marc/reductionRatio
02
ReductionRatioRange
normal reduction
Reproduction note
Microfiche.
Specific material designation
  • microfiche
  • remote
System control number
(GPO)99185830

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