The Resource Nano-CMOS circuit and physical design, Ban P. Wong [and others]
Nano-CMOS circuit and physical design, Ban P. Wong [and others]
Resource Information
The item Nano-CMOS circuit and physical design, Ban P. Wong [and others] represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Missouri Libraries.This item is available to borrow from 1 library branch.
Resource Information
The item Nano-CMOS circuit and physical design, Ban P. Wong [and others] represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Missouri Libraries.
This item is available to borrow from 1 library branch.
- Summary
- Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation
- Language
- eng
- Extent
- xviii, 393 pages
- Contents
-
- 1. Nano-CMOS scaling problems and implications
- pt. I. Process technology and subwavelength optical lithography : physics, theory of operation, issues, and solutions
- 2. CMOS device and process technology
- 3. Theory and practicalities of subwavelength optical lithography
- pt. II. Process scaling impact on design
- 4. Mixed-signal circuit design
- 5. Electrostatic discharge protection design
- 6. Input/output design
- 7. DRAM
- 8. Signal integrity problems in on-chip interconnects
- 9. Ultralow power circuit design
- pt. III. Impact of physical design on manufacturing/yield and performance
- 10. Design for manufacturability
- 11. Design for variability
- Isbn
- 9780471466109
- Label
- Nano-CMOS circuit and physical design
- Title
- Nano-CMOS circuit and physical design
- Statement of responsibility
- Ban P. Wong [and others]
- Subject
-
- CMOS (Circuit intégré)
- CMOS-Schaltung
- Circuit intégré
- Circuits intégrés
- Conception technique
- Integrated circuits -- Design and construction
- Layout <Mikroelektronik>
- MOS complémentaires -- Conception et construction
- Metal oxide semiconductors, Complementary -- Design and construction
- Nanoelectronics
- Nanotechnologie
- Nanotechnologie
- Language
- eng
- Summary
- Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation
- Cataloging source
- DLC
- Dewey number
- 621.39/732
- Illustrations
- illustrations
- Index
- index present
- LC call number
- TK7871.99.M44
- LC item number
- N36 2005
- Literary form
- non fiction
- Nature of contents
- bibliography
- http://library.link/vocab/relatedWorkOrContributorDate
- 1953-
- http://library.link/vocab/relatedWorkOrContributorName
- Wong, Ban P.
- http://library.link/vocab/subjectName
-
- Metal oxide semiconductors, Complementary
- Integrated circuits
- Nanoelectronics
- Circuit intégré
- CMOS (Circuit intégré)
- Conception technique
- Nanotechnologie
- MOS complémentaires
- Circuits intégrés
- CMOS-Schaltung
- Nanotechnologie
- Layout <Mikroelektronik>
- Label
- Nano-CMOS circuit and physical design, Ban P. Wong [and others]
- Bibliography note
- Includes bibliographical references and index
- Carrier category
- volume
- Carrier category code
-
- nc
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
- 1. Nano-CMOS scaling problems and implications -- pt. I. Process technology and subwavelength optical lithography : physics, theory of operation, issues, and solutions -- 2. CMOS device and process technology -- 3. Theory and practicalities of subwavelength optical lithography -- pt. II. Process scaling impact on design -- 4. Mixed-signal circuit design -- 5. Electrostatic discharge protection design -- 6. Input/output design -- 7. DRAM -- 8. Signal integrity problems in on-chip interconnects -- 9. Ultralow power circuit design -- pt. III. Impact of physical design on manufacturing/yield and performance -- 10. Design for manufacturability -- 11. Design for variability
- Control code
- 54425453
- Dimensions
- 24 cm
- Extent
- xviii, 393 pages
- Isbn
- 9780471466109
- Isbn Type
- (cloth)
- Lccn
- 2004002212
- Media category
- unmediated
- Media MARC source
- rdamedia
- Media type code
-
- n
- Other physical details
- illustrations
- System control number
- (OCoLC)54425453
- Label
- Nano-CMOS circuit and physical design, Ban P. Wong [and others]
- Bibliography note
- Includes bibliographical references and index
- Carrier category
- volume
- Carrier category code
-
- nc
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
- 1. Nano-CMOS scaling problems and implications -- pt. I. Process technology and subwavelength optical lithography : physics, theory of operation, issues, and solutions -- 2. CMOS device and process technology -- 3. Theory and practicalities of subwavelength optical lithography -- pt. II. Process scaling impact on design -- 4. Mixed-signal circuit design -- 5. Electrostatic discharge protection design -- 6. Input/output design -- 7. DRAM -- 8. Signal integrity problems in on-chip interconnects -- 9. Ultralow power circuit design -- pt. III. Impact of physical design on manufacturing/yield and performance -- 10. Design for manufacturability -- 11. Design for variability
- Control code
- 54425453
- Dimensions
- 24 cm
- Extent
- xviii, 393 pages
- Isbn
- 9780471466109
- Isbn Type
- (cloth)
- Lccn
- 2004002212
- Media category
- unmediated
- Media MARC source
- rdamedia
- Media type code
-
- n
- Other physical details
- illustrations
- System control number
- (OCoLC)54425453
Subject
- CMOS (Circuit intégré)
- CMOS-Schaltung
- Circuit intégré
- Circuits intégrés
- Conception technique
- Integrated circuits -- Design and construction
- Layout <Mikroelektronik>
- MOS complémentaires -- Conception et construction
- Metal oxide semiconductors, Complementary -- Design and construction
- Nanoelectronics
- Nanotechnologie
- Nanotechnologie
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.missouri.edu/portal/Nano-CMOS-circuit-and-physical-design-Ban-P./u2QLhNTknwE/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.missouri.edu/portal/Nano-CMOS-circuit-and-physical-design-Ban-P./u2QLhNTknwE/">Nano-CMOS circuit and physical design, Ban P. Wong [and others]</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.missouri.edu/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.missouri.edu/">University of Missouri Libraries</a></span></span></span></span></div>
