Coverart for item
The Resource Photopolymers : photoresist materials, processes, and applications, Kenichiro Nakamura

Photopolymers : photoresist materials, processes, and applications, Kenichiro Nakamura

Label
Photopolymers : photoresist materials, processes, and applications
Title
Photopolymers
Title remainder
photoresist materials, processes, and applications
Statement of responsibility
Kenichiro Nakamura
Creator
Author
Subject
Genre
Language
eng
Summary
Advancements in photopolymers have led to groundbreaking achievements in the electronics, print, optical engineering, and medical fields. At present, photopolymers have myriad applications in semiconductor device manufacturing, printed circuit boards (PCBs), ultraviolet (UV) curing, printing plates, 3-D printing, microelectromechanical systems (MEMS), and medical materials. Processes such as photopolymerization, photodegradation, and photocrosslinking, as well as lithography technology in which photofabrications are performed by images of photopolymers, have given rise to very large-scale integrated (VLSI) circuits, microproducts, and more
Member of
Cataloging source
EBLCP
http://library.link/vocab/creatorName
Nakamura, Kenichiro
Dewey number
  • 620.1/9204295
  • 620.19204295
Illustrations
illustrations
Index
index present
LC call number
TA455.P58 N35 2014
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
Series statement
Optics and Photonics
Series volume
10
http://library.link/vocab/subjectName
  • Microelectronics
  • Photopolymerization
  • Photopolymers
  • Photopolymers
  • Photoresists
  • TECHNOLOGY & ENGINEERING
  • TECHNOLOGY & ENGINEERING
  • Microelectronics
  • Photopolymerization
  • Photopolymers
  • Photopolymers
  • Photoresists
Label
Photopolymers : photoresist materials, processes, and applications, Kenichiro Nakamura
Instantiates
Publication
Copyright
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Basic Idea of Photopolymerization -- Chemically Amplified Resists -- Process of Chemically Amplified Resists -- Nanoimprint -- Industrial Application of Photopolymers
Control code
884012539
Extent
1 online resource (x, 188 pages)
Form of item
online
Isbn
9781466517318
Lccn
2014006188
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other control number
10.1201/9781315216331
Other physical details
illustrations.
Specific material designation
remote
System control number
(OCoLC)884012539
Label
Photopolymers : photoresist materials, processes, and applications, Kenichiro Nakamura
Publication
Copyright
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Basic Idea of Photopolymerization -- Chemically Amplified Resists -- Process of Chemically Amplified Resists -- Nanoimprint -- Industrial Application of Photopolymers
Control code
884012539
Extent
1 online resource (x, 188 pages)
Form of item
online
Isbn
9781466517318
Lccn
2014006188
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other control number
10.1201/9781315216331
Other physical details
illustrations.
Specific material designation
remote
System control number
(OCoLC)884012539

Library Locations

    • Ellis LibraryBorrow it
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      38.944491 -92.326012
    • Engineering Library & Technology CommonsBorrow it
      W2001 Lafferre Hall, Columbia, MO, 65211, US
      38.946102 -92.330125
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