Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
The Resource Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
Resource Information
The item Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Missouri Libraries.This item is available to borrow from 1 library branch.
Resource Information
The item Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in University of Missouri Libraries.
This item is available to borrow from 1 library branch.
- Language
- eng
- Extent
- 1 online resource (ix, 468 pages)
- Note
- Title from PDF title page (ACS publications, viewed Aug 27, 2009)
- Contents
-
- Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie
- Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram
- Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai
- Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai
- New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner
- Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa
- Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker
- Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa
- Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa
- Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa
- Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku
- Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka
- Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase
- Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase
- Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka
- Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove
- Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji
- Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura
- Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote
- Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida
- Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke
- Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue
- Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober
- Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity
- G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis
- Excitation dynamics in conjugated polymers / H. Bässler, E.O. Göbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada
- Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo
- Present and future of fullerenes : C60 and tubules / Katsumi Tanigaki
- Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff
- Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura
- Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl
- Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos
- UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto
- Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa
- Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto
- Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski
- New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo
- Isbn
- 9780841215009
- Label
- Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993
- Title
- Polymeric materials for microelectronic applications
- Title remainder
- science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993
- Statement of responsibility
- Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
- Subject
-
- Conference papers and proceedings
- Conference papers and proceedings
- Kongress
- Kongress
- Microelectronics -- Materials
- Microelectronics -- Materials
- Microelectronics -- Materials -- Congresses
- Microélectronique -- Matériaux
- Mikroelektronik
- Mikroelektronik
- Polymere
- Polymere
- Polymers
- Polymers
- Polymers -- Congresses
- Polymères
- TECHNOLOGY & ENGINEERING -- Mechanical
- Tecnologia de altos polimeros
- Werkstoffkunde
- Werkstoffkunde
- Language
- eng
- Action
- digitized
- Cataloging source
- MUU
- Dewey number
- 621.381
- Illustrations
- illustrations
- Index
- index present
- LC call number
- TK7871.15.P6
- LC item number
- P59 1994
- Literary form
- non fiction
- NAL call number
- QD1.A45
- NAL item number
- no.579
- Nature of contents
-
- dictionaries
- bibliography
- http://library.link/vocab/relatedWorkOrContributorDate
-
- 1946-
- 1941-
- http://library.link/vocab/relatedWorkOrContributorName
-
- Ito, Hiroshi
- Tagawa, Seiichi
- Horie, Kazuyuki
- Kōbunshi Gakkai (Japan)
- American Chemical Society
- Series statement
- ACS symposium series
- Series volume
- 579
- http://library.link/vocab/subjectName
-
- Microelectronics
- Polymers
- TECHNOLOGY & ENGINEERING
- Microelectronics
- Polymers
- Tecnologia de altos polimeros
- Microélectronique
- Polymères
- Mikroelektronik
- Polymere
- Kongress
- Werkstoffkunde
- Label
- Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
- Note
- Title from PDF title page (ACS publications, viewed Aug 27, 2009)
- Bibliography note
- Includes bibliographical references and indexes
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
- Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie -- Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram -- Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai -- Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai -- New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner -- Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa -- Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker -- Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa -- Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa -- Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa -- Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku -- Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka -- Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase -- Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase -- Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka -- Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove -- Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji -- Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura -- Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote -- Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida -- Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke -- Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue -- Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober -- Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity -- G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis -- Excitation dynamics in conjugated polymers / H. Bässler, E.O. Göbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada -- Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo -- Present and future of fullerenes : C60 and tubules / Katsumi Tanigaki -- Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff -- Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura -- Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl -- Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos -- UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto -- Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa -- Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto -- Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski -- New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo
- Control code
- 435438607
- Extent
- 1 online resource (ix, 468 pages)
- Form of item
- online
- Isbn
- 9780841215009
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations.
- Reproduction note
- Electronic reproduction.
- Specific material designation
- remote
- System control number
- (OCoLC)435438607
- System details
- Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
- Label
- Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
- Note
- Title from PDF title page (ACS publications, viewed Aug 27, 2009)
- Bibliography note
- Includes bibliographical references and indexes
- Carrier category
- online resource
- Carrier category code
-
- cr
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
-
- txt
- Content type MARC source
- rdacontent
- Contents
- Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie -- Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram -- Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai -- Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai -- New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner -- Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa -- Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker -- Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa -- Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa -- Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa -- Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku -- Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka -- Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase -- Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase -- Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka -- Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove -- Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji -- Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura -- Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote -- Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida -- Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke -- Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue -- Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober -- Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity -- G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis -- Excitation dynamics in conjugated polymers / H. Bässler, E.O. Göbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada -- Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo -- Present and future of fullerenes : C60 and tubules / Katsumi Tanigaki -- Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff -- Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura -- Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl -- Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos -- UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto -- Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa -- Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto -- Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski -- New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo
- Control code
- 435438607
- Extent
- 1 online resource (ix, 468 pages)
- Form of item
- online
- Isbn
- 9780841215009
- Media category
- computer
- Media MARC source
- rdamedia
- Media type code
-
- c
- Other physical details
- illustrations.
- Reproduction note
- Electronic reproduction.
- Specific material designation
- remote
- System control number
- (OCoLC)435438607
- System details
- Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Subject
- Conference papers and proceedings
- Conference papers and proceedings
- Kongress
- Kongress
- Microelectronics -- Materials
- Microelectronics -- Materials
- Microelectronics -- Materials -- Congresses
- Microélectronique -- Matériaux
- Mikroelektronik
- Mikroelektronik
- Polymere
- Polymere
- Polymers
- Polymers
- Polymers -- Congresses
- Polymères
- TECHNOLOGY & ENGINEERING -- Mechanical
- Tecnologia de altos polimeros
- Werkstoffkunde
- Werkstoffkunde
Genre
Member of
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.missouri.edu/portal/Polymeric-materials-for-microelectronic/dUGoL6RbgCw/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.missouri.edu/portal/Polymeric-materials-for-microelectronic/dUGoL6RbgCw/">Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.missouri.edu/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.missouri.edu/">University of Missouri Libraries</a></span></span></span></span></div>
