Coverart for item
The Resource Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor

Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor

Label
Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993
Title
Polymeric materials for microelectronic applications
Title remainder
science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993
Statement of responsibility
Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
Contributor
Subject
Genre
Language
eng
Member of
Action
digitized
Cataloging source
MUU
Dewey number
621.381
Illustrations
illustrations
Index
index present
LC call number
TK7871.15.P6
LC item number
P59 1994
Literary form
non fiction
NAL call number
QD1.A45
NAL item number
no.579
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
  • 1946-
  • 1941-
http://library.link/vocab/relatedWorkOrContributorName
  • Ito, Hiroshi
  • Tagawa, Seiichi
  • Horie, Kazuyuki
  • Kōbunshi Gakkai (Japan)
  • American Chemical Society
Series statement
ACS symposium series
Series volume
579
http://library.link/vocab/subjectName
  • Microelectronics
  • Polymers
  • TECHNOLOGY & ENGINEERING
  • Microelectronics
  • Polymers
  • Tecnologia de altos polimeros
  • Microélectronique
  • Polymères
  • Mikroelektronik
  • Polymere
  • Kongress
  • Werkstoffkunde
Label
Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
Instantiates
Publication
Note
Title from PDF title page (ACS publications, viewed Aug 27, 2009)
Bibliography note
Includes bibliographical references and indexes
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie -- Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram -- Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai -- Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai -- New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner -- Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa -- Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker -- Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa -- Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa -- Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa -- Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku -- Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka -- Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase -- Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase -- Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka -- Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove -- Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji -- Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura -- Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote -- Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida -- Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke -- Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue -- Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober -- Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity -- G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis -- Excitation dynamics in conjugated polymers / H. Bässler, E.O. Göbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada -- Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo -- Present and future of fullerenes : C60 and tubules / Katsumi Tanigaki -- Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff -- Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura -- Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl -- Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos -- UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto -- Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa -- Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto -- Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski -- New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo
Control code
435438607
Extent
1 online resource (ix, 468 pages)
Form of item
online
Isbn
9780841215009
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations.
Reproduction note
Electronic reproduction.
Specific material designation
remote
System control number
(OCoLC)435438607
System details
Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Label
Polymeric materials for microelectronic applications : science and technology : developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 meeting, Kawasaki, Japan, November 15-19, 1993, Hiroshi Ito, editor, Seiichi Tagawa, editor, Kazuyuki Horie, editor
Publication
Note
Title from PDF title page (ACS publications, viewed Aug 27, 2009)
Bibliography note
Includes bibliographical references and indexes
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Photophysics, photochemistry, and photo-optical effects in polymer solids / Kazuyuki Horie -- Photochemistry of liquid-crystalline polymers / David Creed, Richard A. Cozad, Anselm C. Griffin, Charles E. Hoyle, Lixin Jin, Petharnan Subramanian, Sangya S. Varma, and Krishnan Venkataram -- Dissociative electron capture of polymers with bridging acid anhydrides : matrix isolation electron spin resonance study / Paul H. Kasai -- Luminescence study of ion-irradiated aromatic polymers / Y. Aoki, H. Namba, F. Hosoi, and S. Nagai -- New directions in the design of chemically amplified resists / E. Reichmanis, M.E. Galvin, K.E. Uhrich, P. Mirau, and S.A. Heffner -- Dual-tone and aqueous base developable negative resists based on acid-catalyzed dehydration / Hiroshi Ito and Yasunari Maekawa -- Importance of donor-acceptor reactions for the photogeneration of acid in chemically amplified resists / Nigel P. Hacker -- Acid generation in chemically amplified resist films / Takeo Watanabe, Yoshio Yamashita, Takahiro Kozawa, Yoichi Yoshida, and Seiichi Tagawa -- Radiation-induced reactions of onium salts in novolak / Takahiro Kozawa, M. Uesaka, Takeo Watanabe, Yoshio Yamashita, H. Shibata, Yoichi Yoshida, and Seiichi Tagawa -- Polymeric sulfonium salts as acid generators for excimer laser lithography / Katsumi Maeda, Kaichiro Nakano, and Etsuo Hasegawa -- Application of triaryl phosphate to photosensitive materials : photoreaction mechanism of triaryl phosphate / I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku -- Effect of water on the surface insoluble layer of chemically amplified positive resists / Jiro Nakamura, Hiroshi Ban, Yoshio Kawai, and Akinobu Tanaka -- Thermal properties of a chemically amplified resist resin / Koji Asakawa, Akinori Hongu, Naohiko Oyasato, and Makoto Nakase -- Modeling and simulation of chemically amplified resist systems / Akinori Hongu, Koji Asakawa, Tohru Ushirogouchi, Hiromitsu Wakabayashi, Satoshi Saito, and Makoto Nakase -- Surface imaging using photoinduced acid-catalyzed formation of polysiloxanes at air-polymer interface / Masamitsu Shirai, Tomonobu Sumino, and Masahiro Tsunooka -- Surface imaging for applications to sub-0.35-[micrometer] lithography / Ki-Ho Baik and Luc Van den hove -- Molecular design of epoxy resins for microelectronics packaging / Masashi Kaji -- Uniaxial and in-plane molecular orientation of polyimides and their precursor as studied by absorption dichroism of perylenebisimide dye / M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura -- Novel photosensitive polyimide precursor based on polyisoimide using nifedipine as a dissolution inhibitor / Amane Mochizuki, Tadashi Teranishi, Mitsuru Ueda, and Toshihiko Omote -- Photochemical behavior of nifedipine derivatives and application to photosensitive polyimides / T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida -- Waveguiding in high-temperature-stable materials / C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke -- Rodlike fluorinated polyimide as an in-plane birefringent optical material / Shinji Ando, Takashi Sawada, and Yasuyuki Inoue -- Preparation of polyphenylene and copolymers for microelectronics applications / N.A. Johnen, H.K. Kim, and C.K. Ober -- Charge-carrier generation and migration in a polydiacetylene compound studied by pulse radiolysis time-resolved microwave conductivity -- G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis -- Excitation dynamics in conjugated polymers / H. Bässler, E.O. Göbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada -- Application of polyaniline films to radiation dosimetry / Yuichi Oki, Takenori Suzuki, Taichi Miura, Masaharu Numajiri, and Kenjiro Kondo -- Present and future of fullerenes : C60 and tubules / Katsumi Tanigaki -- Photoresponsive liquid-crystalline polymers : holographic storage, digital storage, and holographic optical components / Klaus Anderle and Joachim H. Wendorff -- Azimuthal alignment photocontrol of liquid crystals / Kunihiro Ichimura -- Electronic structure and UV absorption spectra of permethylated silicon chains / Harald S. Plitt, John W. Downing, Hiroyuki Teramae, Mary Katherine Raymond, and Josef Michl -- Electronic properties of polysilanes / R.G. Kepler and Z.G. Soos -- UV photoelectron spectroscopy of polysilanes and polygermanes / Kazuhiko Seki, Akira Yuyama, Satoru Narioka, Hisao Ishii, Shinji Hasegawa, Hiroaki Isaka, Masaie Fujino, Michiya Fujiki, and Nobuo Matsumoto -- Radical ions of polysilynes / Akira Watanabe, Minoru Matsuda, Yoichi Yoshida, and Seiichi Tagawa -- Optical properties of silicon-based polymers with different backbone structures / Katsunori Suzuki, Yoshihiko Kanemitsu, Soichiro Kyushin, and Hideyuki Matsumoto -- Synthesis and properties of polysilanes prepared by ring-opening polymerization / Eric Fossum and Krzysztof Matyjaszewski -- New synthesis and functionalization of photosensitive poly(silyl ether) by addition reaction of bisepoxide with dichlorosilane / Atsushi Kameyama, Nobuyuki Hayashi, and Tadatomi Nishikubo
Control code
435438607
Extent
1 online resource (ix, 468 pages)
Form of item
online
Isbn
9780841215009
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations.
Reproduction note
Electronic reproduction.
Specific material designation
remote
System control number
(OCoLC)435438607
System details
Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.

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