Coverart for item
The Resource Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999, editors, Leo Miglio & Francois d'Heurle

Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999, editors, Leo Miglio & Francois d'Heurle

Label
Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999
Title
Silicides
Title remainder
fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999
Statement of responsibility
editors, Leo Miglio & Francois d'Heurle
Title variation
  • 16th Course of the International School of Solid State Physics
  • Silicides, fundamentals and applications
Creator
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
NAG
Dewey number
546/.6832
Illustrations
illustrations
Index
index present
LC call number
QD181.S6
LC item number
I58 1999
Literary form
non fiction
http://bibfra.me/vocab/lite/meetingDate
1999
http://bibfra.me/vocab/lite/meetingName
International School of Solid State Physics
Nature of contents
bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Miglio, L
  • D'Heurle, F. M
Series statement
The science and culture series. Materials science
Series volume
1
http://library.link/vocab/subjectName
  • Silicides
  • Electronics
  • Integrated circuits
  • Thin films
Label
Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999, editors, Leo Miglio & Francois d'Heurle
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
volume
Carrier category code
nc
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Crystal chemistry of metal silicides / R. Madar -- Structural features of binary transition metal silicides / I. Engstrom -- Bonding and polymorphism in transition metal disilicides / L. Miglio, M. Iannuzzi and D. Migas -- Diffusion in silicides: basic approach and practical applications / P. Gas and F. M. d'Heurle -- Silicides and thermodynamics / C. Bernard and A. Pisch -- Optical properties of silicides: theory and experiment / V. Antonov and F. Marabelli -- Electronic structure of Ir[subscript 3]Si[subscript 5] / K.Goransson -- Ion beam synthesized [beta]-FeSi[subscript 2] precipitates in Si: structural characterization and origin of the 1.54 [mu]m luminescence / M. G. Grimaldi, S. Coffa and C. Spinella -- Optical characterization of Ru[subscript 2]Si[subscript 3] / W. Henrion, M. Rebien and A. G. Birdwell / [et al.] -- Fundamental electronic properties of semiconducting silicides / V. Borisenko -- Semiconducting silicides -- thermoelectric properties and applications / A. Heinrich -- Metallic silicides / G. Ottaviani -- Conversion electron Mossbauer spectroscopy study of iron disilicide / M. Fanciulli -- The kinetics of reactive phase formation: silicides / F. M. d'Heurle -- Reactive phase formation in binary and ternary silicide systems / A. A. Kodentsov, M. J. H. Van Dal and C. Cserhati / [et al.] -- Epitaxial silicides / H. von Kanel -- Ion bean synthesis, molecular beam allotaxy and self-assembled patterning of epitaxial silicides / S. Mantl -- Silicides: materials science and applications for microelectronics / K. Maex and A. Lauwers -- Mechanisms for enhanced formation of the C54 phase of titanium silicides / J. M. E. Harper, C. Cabral and C. Lavoie / [et al.] -- Titanium and tungsten silicides in silicon device technology / G. Queirolo -- Micro-Raman spectroscopy applied to microelectronics: the phase transition of TiSi[subscript 2] from C49 to C54 / S. Quilici -- Stresses in silicides thin films obtained by solid state reaction / S.-L. Zhang -- The changing views on the Schottky barrier / R. Tung -- Internal photoemission spectroscopy for a PtSi/p-Si Schottky junction / B. Aslan and T. Turan -- Metal rich structural silicides / A. J. Thom, M. K. Meyer and J. J. Williams / [et al.] -- The epitaxy of CoSi[subscript 2] on Si substrates: a review / S.-L. Zhang and F. M. d'Heurle -- Agglomeration of cobalt disilicide on silicon / A. Alberti, L. Kappius and F. M. d'Heurle
Control code
48642830
Dimensions
23 cm
Extent
viii, 377 pages
Isbn
9789810244521
Lccn
2001280362
Media category
unmediated
Media MARC source
rdamedia
Media type code
n
Other physical details
illustrations
Label
Silicides : fundamentals and applications : proceedings of the 16th Course of the International School of Solid State Physics, Erice, Italy, 5-16 June 1999, editors, Leo Miglio & Francois d'Heurle
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
volume
Carrier category code
nc
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Crystal chemistry of metal silicides / R. Madar -- Structural features of binary transition metal silicides / I. Engstrom -- Bonding and polymorphism in transition metal disilicides / L. Miglio, M. Iannuzzi and D. Migas -- Diffusion in silicides: basic approach and practical applications / P. Gas and F. M. d'Heurle -- Silicides and thermodynamics / C. Bernard and A. Pisch -- Optical properties of silicides: theory and experiment / V. Antonov and F. Marabelli -- Electronic structure of Ir[subscript 3]Si[subscript 5] / K.Goransson -- Ion beam synthesized [beta]-FeSi[subscript 2] precipitates in Si: structural characterization and origin of the 1.54 [mu]m luminescence / M. G. Grimaldi, S. Coffa and C. Spinella -- Optical characterization of Ru[subscript 2]Si[subscript 3] / W. Henrion, M. Rebien and A. G. Birdwell / [et al.] -- Fundamental electronic properties of semiconducting silicides / V. Borisenko -- Semiconducting silicides -- thermoelectric properties and applications / A. Heinrich -- Metallic silicides / G. Ottaviani -- Conversion electron Mossbauer spectroscopy study of iron disilicide / M. Fanciulli -- The kinetics of reactive phase formation: silicides / F. M. d'Heurle -- Reactive phase formation in binary and ternary silicide systems / A. A. Kodentsov, M. J. H. Van Dal and C. Cserhati / [et al.] -- Epitaxial silicides / H. von Kanel -- Ion bean synthesis, molecular beam allotaxy and self-assembled patterning of epitaxial silicides / S. Mantl -- Silicides: materials science and applications for microelectronics / K. Maex and A. Lauwers -- Mechanisms for enhanced formation of the C54 phase of titanium silicides / J. M. E. Harper, C. Cabral and C. Lavoie / [et al.] -- Titanium and tungsten silicides in silicon device technology / G. Queirolo -- Micro-Raman spectroscopy applied to microelectronics: the phase transition of TiSi[subscript 2] from C49 to C54 / S. Quilici -- Stresses in silicides thin films obtained by solid state reaction / S.-L. Zhang -- The changing views on the Schottky barrier / R. Tung -- Internal photoemission spectroscopy for a PtSi/p-Si Schottky junction / B. Aslan and T. Turan -- Metal rich structural silicides / A. J. Thom, M. K. Meyer and J. J. Williams / [et al.] -- The epitaxy of CoSi[subscript 2] on Si substrates: a review / S.-L. Zhang and F. M. d'Heurle -- Agglomeration of cobalt disilicide on silicon / A. Alberti, L. Kappius and F. M. d'Heurle
Control code
48642830
Dimensions
23 cm
Extent
viii, 377 pages
Isbn
9789810244521
Lccn
2001280362
Media category
unmediated
Media MARC source
rdamedia
Media type code
n
Other physical details
illustrations

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