Coverart for item
The Resource The capabilities and limitations of auger sputter profiling for studies of semiconductors, S.A. Schwarz [and others] ; sponsored by the Defense Advanced Research Projects Agency, (microform)

The capabilities and limitations of auger sputter profiling for studies of semiconductors, S.A. Schwarz [and others] ; sponsored by the Defense Advanced Research Projects Agency, (microform)

Label
The capabilities and limitations of auger sputter profiling for studies of semiconductors
Title
The capabilities and limitations of auger sputter profiling for studies of semiconductors
Statement of responsibility
S.A. Schwarz [and others] ; sponsored by the Defense Advanced Research Projects Agency
Contributor
Subject
Genre
Language
eng
Member of
Cataloging source
GZM
Government publication
federal national government publication
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
bibliography
http://library.link/vocab/relatedWorkOrContributorName
  • Schwarz, S. A
  • United States
Series statement
  • Semiconductor measurement technology
  • NBS special publication
Series volume
400-67
http://library.link/vocab/subjectName
  • Sputtering (Physics)
  • Metal oxide semiconductors
  • Semiconductors
Label
The capabilities and limitations of auger sputter profiling for studies of semiconductors, S.A. Schwarz [and others] ; sponsored by the Defense Advanced Research Projects Agency, (microform)
Instantiates
Publication
Bibliography note
Includes bibliographical references
Carrier category
microfiche
Carrier category code
  • he
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
8343479
Dimensions
4x6 in. or 11x15 cm.
Emulsion on film
diazo
Extent
vi, 46 pages
Form of item
microfiche
Generation
first generation master
Media category
microform
Media MARC source
rdamedia
Media type code
  • h
Other physical details
illustrations
Positive negative aspect
negative
http://bibfra.me/vocab/marc/reductionRatio
02
ReductionRatioRange
normal reduction
Reproduction note
Microfiche.
Specific material designation
microfiche
System control number
(WaOLN)15272
Label
The capabilities and limitations of auger sputter profiling for studies of semiconductors, S.A. Schwarz [and others] ; sponsored by the Defense Advanced Research Projects Agency, (microform)
Publication
Bibliography note
Includes bibliographical references
Carrier category
microfiche
Carrier category code
  • he
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
8343479
Dimensions
4x6 in. or 11x15 cm.
Emulsion on film
diazo
Extent
vi, 46 pages
Form of item
microfiche
Generation
first generation master
Media category
microform
Media MARC source
rdamedia
Media type code
  • h
Other physical details
illustrations
Positive negative aspect
negative
http://bibfra.me/vocab/marc/reductionRatio
02
ReductionRatioRange
normal reduction
Reproduction note
Microfiche.
Specific material designation
microfiche
System control number
(WaOLN)15272

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      38.944491 -92.326012
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