Coverart for item
The Resource Thin film materials, processes, and reliability, editors: G. Mathad [and others], (electronic resource)

Thin film materials, processes, and reliability, editors: G. Mathad [and others], (electronic resource)

Label
Thin film materials, processes, and reliability
Title
Thin film materials, processes, and reliability
Statement of responsibility
editors: G. Mathad [and others]
Contributor
Editor
Subject
Genre
Language
eng
Member of
Cataloging source
MUU
Illustrations
illustrations
Index
index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorDate
2007 :
http://library.link/vocab/relatedWorkOrContributorName
  • Mathad, G. S.
  • Electrochemical Society
  • Electrochemical Society
Series statement
ECS transactions,
Series volume
v. 6, no. 12
http://library.link/vocab/subjectName
Thin films
Label
Thin film materials, processes, and reliability, editors: G. Mathad [and others], (electronic resource)
Instantiates
Publication
Note
  • Title from PDF t.p. (ECS, viewed Apr. 13, 2011)
  • "Sponsoring Division: Dielectric Science & Technology."
  • "The papers included in this issue of ECS Transactions were originally presented in the symposium "Thin Film Materials, Processes, and Reliability", held during the 211th meeting of The Electrochemical Society, in Chicago, Illinois, from May 6 to 11, 2007"--P. iii
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Advanced Metrology for Porous Low-k Integration into Cu back-end Processes / Paul A. Ryan ... [et al.] -- Enhanced Cracking Resistance of Plasma Deposited Low-k SiCOH Films with Nano Imbedded Layers Insertion / Son V. Nguyen ... [et al.] -- Effects of TiCl4-Based PECVD-Ti/CVD-TiN Barrier Layers on the BF2-Doped Si for Contact Plug Technology / Tsai-Yu Huang ... [et al.] -- Highly Thermal-Stable Amorphous TaSi2C[subscript x] Thin Films / Ting-Yi Lin ... [et al.] -- In-Situ Formation of Ag Capping Layer in Copper Chemical Mechanical Polishing / Mincheol Kang, Sung Ki Cho, and Jae Jeong Kim -- Surface Treatment of Indium Tin Oxide (ITO) using Radio Frequency Atmospheric and Low Pressure Plasma for Organic Light Emitting Diodes (OLED) / Mi-Hee Jung and Ho-Suk Choi
Control code
713024083
Extent
1 online resource (59 pages)
Form of item
online
Isbn
9781566775908
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations.
Specific material designation
remote
System control number
(OCoLC)713024083
Label
Thin film materials, processes, and reliability, editors: G. Mathad [and others], (electronic resource)
Publication
Note
  • Title from PDF t.p. (ECS, viewed Apr. 13, 2011)
  • "Sponsoring Division: Dielectric Science & Technology."
  • "The papers included in this issue of ECS Transactions were originally presented in the symposium "Thin Film Materials, Processes, and Reliability", held during the 211th meeting of The Electrochemical Society, in Chicago, Illinois, from May 6 to 11, 2007"--P. iii
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
txt
Content type MARC source
rdacontent
Contents
Advanced Metrology for Porous Low-k Integration into Cu back-end Processes / Paul A. Ryan ... [et al.] -- Enhanced Cracking Resistance of Plasma Deposited Low-k SiCOH Films with Nano Imbedded Layers Insertion / Son V. Nguyen ... [et al.] -- Effects of TiCl4-Based PECVD-Ti/CVD-TiN Barrier Layers on the BF2-Doped Si for Contact Plug Technology / Tsai-Yu Huang ... [et al.] -- Highly Thermal-Stable Amorphous TaSi2C[subscript x] Thin Films / Ting-Yi Lin ... [et al.] -- In-Situ Formation of Ag Capping Layer in Copper Chemical Mechanical Polishing / Mincheol Kang, Sung Ki Cho, and Jae Jeong Kim -- Surface Treatment of Indium Tin Oxide (ITO) using Radio Frequency Atmospheric and Low Pressure Plasma for Organic Light Emitting Diodes (OLED) / Mi-Hee Jung and Ho-Suk Choi
Control code
713024083
Extent
1 online resource (59 pages)
Form of item
online
Isbn
9781566775908
Media category
computer
Media MARC source
rdamedia
Media type code
c
Other physical details
illustrations.
Specific material designation
remote
System control number
(OCoLC)713024083

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