The Resource Thin film techniques for the fabrication of nano-scale high energy density capacitors, by James Nicholas Reck, (electronic resource)

Thin film techniques for the fabrication of nano-scale high energy density capacitors, by James Nicholas Reck, (electronic resource)

Label
Thin film techniques for the fabrication of nano-scale high energy density capacitors
Title
Thin film techniques for the fabrication of nano-scale high energy density capacitors
Statement of responsibility
by James Nicholas Reck
Creator
Subject
Genre
Language
eng
Summary
  • "Dielectric thin films of either TiO2 or BaTiO3 were sputtered in O2/Ar plasmas on Si wafers to thicknesses ranging from approximately 25 to 200 nm with patterned Ni or Pt electrodes sputtered in Ar plasmas at thicknesses from about 20 to 250 nm to form nano-capacitors. Statistical design of experiments (DOE) was used to determine the effects of the deposition power, plasma composition, and deposition temperature on the measured electrical properties of the nano-capacitors. Additional tests to determine the effects of the dielectric and electrode thickness on the measured dielectric responses of the devices were also undertaken. Characterization was performed with a combination of direct current (DC) and alternating current (AC) testing methods including AC impedance, coercive field and leakage current versus voltage, scanning electron microscopy, transmission electron microscopy (TEM), x-ray diffraction (XRD), x-ray photoelectron spectroscopy, focused ion beam microscopy, and atomic force microscopy. The dielectric properties were found to depend on complex interactions of the process variables that could be modeled using statistical software. The permittivity was found to range from 100 to 10,000 with losses between 0.013 and 0.570. The resistance at 1 V DC varied from approximately 1.5 to 360 G[Omega], and either a ferroelectric or paraelectric hysteretic response was observed for all specimens tested. Chemical analyses showed the films to be oxygen rich, while XRD and TEM data indicated the BaTiO3 was amorphous. The electrical, chemical, and microstructural properties were found to depend on the sputtering conditions of the BaTiO3, dielectric thickness, electrode material choice, and the electrode thickness. Collectively, the results indicated that the properties of nanometer thick dielectric and electrode materials have a significant impact on the measured electrical properties"--Abstract, page iv
  • "Dielectric thin films of either TiO2 or BaTiO3 were sputtered in O2/Ar plasmas on Si wafers to thicknesses ranging from approximately 25 to 200 nm with patterned Ni or Pt electrodes sputtered in Ar plasmas at thicknesses from about 20 to 250 nm to form nano-capacitors. Statistical design of experiments (DOE) was used to determine the effects of the deposition power, plasma composition, and deposition temperature on the measured electrical properties of the nano-capacitors. Additional tests to determine the effects of the dielectric and electrode thickness on the measured dielectric responses of the devices were also undertaken. Characterization was performed with a combination of direct current (DC) and alternating current (AC) testing methods including AC impedance, coercive field and leakage current versus voltage, scanning electron microscopy, transmission electron microscopy (TEM), x-ray diffraction (XRD), x-ray photoelectron spectroscopy, focused ion beam microscopy, and atomic force microscopy. The dielectric properties were found to depend on complex interactions of the process variables that could be modeled using statistical software. The permittivity was found to range from 100 to 10,000 with losses between 0.013 and 0.570. The resistance at 1 V DC varied from approximately 1.5 to 360 G, and either a ferroelectric or paraelectric hysteretic response was observed for all specimens tested. Chemical analyses showed the films to be oxygen rich, while XRD and TEM data indicated the BaTiO3 was amorphous. The electrical, chemical, and microstructural properties were found to depend on the sputtering conditions of the BaTiO3, dielectric thickness, electrode material choice, and the electrode thickness. Collectively, the results indicated that the properties of nanometer thick dielectric and electrode materials have a significant impact on the measured electrical properties"--Abstract, p. iv
Related
Member of
Cataloging source
UMR
http://library.link/vocab/creatorDate
1981-
http://library.link/vocab/creatorName
Reck, James N.
Degree
Ph. D.
Dissertation year
2008.
Granting institution
Missouri University of Science and Technology
Illustrations
illustrations
Index
no index present
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
  • theses
http://library.link/vocab/subjectName
  • Thin films
  • Sputtering (Physics)
  • Capacitors
  • Nanotechnology
  • Electrodes
  • Dielectrics
Target audience
specialized
Label
Thin film techniques for the fabrication of nano-scale high energy density capacitors, by James Nicholas Reck, (electronic resource)
Instantiates
Publication
Note
  • Vita
  • The entire thesis text is included in file
  • Title from title screen of thesis/dissertation PDF file (viewed March 18, 2009)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
316229969
Dimensions
unknown
Extent
1 online resource (xiv, 220 pages)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations.
Specific material designation
remote
System control number
(OCoLC)316229969
Label
Thin film techniques for the fabrication of nano-scale high energy density capacitors, by James Nicholas Reck, (electronic resource)
Publication
Note
  • Vita
  • The entire thesis text is included in file
  • Title from title screen of thesis/dissertation PDF file (viewed March 18, 2009)
Bibliography note
Includes bibliographical references
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Color
black and white
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Control code
316229969
Dimensions
unknown
Extent
1 online resource (xiv, 220 pages)
Form of item
electronic
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
Other physical details
illustrations.
Specific material designation
remote
System control number
(OCoLC)316229969

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