Coverart for item
The Resource Transmission electron microscopy in micro-nanoelectronics, edited by Alain Claverie

Transmission electron microscopy in micro-nanoelectronics, edited by Alain Claverie

Label
Transmission electron microscopy in micro-nanoelectronics
Title
Transmission electron microscopy in micro-nanoelectronics
Statement of responsibility
edited by Alain Claverie
Contributor
Subject
Language
eng
Summary
Today, the availability of bright and highly coherent electron sources and sensitive detectors has radically changed the type and quality of the information which can be obtained by transmission electron microscopy (TEM). TEMs are now present in large numbers not only in academia, but also in industrial research centers and fabs. This book presents in a simple and practical way the new quantitative techniques based on TEM which have recently been invented or developed to address most of the main challenging issues scientists and process engineers have to face
Member of
Cataloging source
EBLCP
Dewey number
621.38152
Index
index present
LC call number
QC611
LC item number
.C384 2013
Literary form
non fiction
Nature of contents
  • dictionaries
  • bibliography
http://library.link/vocab/relatedWorkOrContributorName
Claverie, A.
Series statement
ISTE
http://library.link/vocab/subjectName
  • Transmission electron microscopy
  • Semiconductors
  • TECHNOLOGY & ENGINEERING
  • TECHNOLOGY & ENGINEERING
  • Semiconductors
  • Transmission electron microscopy
Label
Transmission electron microscopy in micro-nanoelectronics, edited by Alain Claverie
Instantiates
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Active Dopant Profiling in the TEM by Off-Axis Electron Holography / David Cooper -- Dopant Distribution Quantitative Analysis Using STEM-EELS/EDX Spectroscopy Techniques / Roland Pantel, Germain Servanton -- Quantitative Strain Measurement in Advanced Devices: A Comparison Between Convergent Beam Electron Diffraction and Nanobeam Diffraction / Laurent Clement, Dominique Delille -- Dark-Field Electron Holography for Strain Mapping / Martin Hytch [and others] -- Magnetic mapping using electron holography / Etienne Snoeck, Christophe Gatel -- Interdiffusion and chemical reaction at interfaces by TEM/EELS / Sylvie Schamm-Chardon -- Characterization of process-induced defects / Nikolay Cherkashin, Alain Claverie -- In situ characterization methods in transmission electron microscopy / Aurelein Massebouef -- Specimen preparation for semiconductor analysis / David Cooper, Gerard Ben Assayag
Control code
827208448
Dimensions
unknown
Extent
1 online resource (259 pages)
Form of item
online
Isbn
9781118579053
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
http://library.link/vocab/ext/overdrive/overdriveId
cl0500000277
Specific material designation
remote
System control number
(OCoLC)827208448
Label
Transmission electron microscopy in micro-nanoelectronics, edited by Alain Claverie
Publication
Bibliography note
Includes bibliographical references and index
Carrier category
online resource
Carrier category code
  • cr
Carrier MARC source
rdacarrier
Content category
text
Content type code
  • txt
Content type MARC source
rdacontent
Contents
Active Dopant Profiling in the TEM by Off-Axis Electron Holography / David Cooper -- Dopant Distribution Quantitative Analysis Using STEM-EELS/EDX Spectroscopy Techniques / Roland Pantel, Germain Servanton -- Quantitative Strain Measurement in Advanced Devices: A Comparison Between Convergent Beam Electron Diffraction and Nanobeam Diffraction / Laurent Clement, Dominique Delille -- Dark-Field Electron Holography for Strain Mapping / Martin Hytch [and others] -- Magnetic mapping using electron holography / Etienne Snoeck, Christophe Gatel -- Interdiffusion and chemical reaction at interfaces by TEM/EELS / Sylvie Schamm-Chardon -- Characterization of process-induced defects / Nikolay Cherkashin, Alain Claverie -- In situ characterization methods in transmission electron microscopy / Aurelein Massebouef -- Specimen preparation for semiconductor analysis / David Cooper, Gerard Ben Assayag
Control code
827208448
Dimensions
unknown
Extent
1 online resource (259 pages)
Form of item
online
Isbn
9781118579053
Media category
computer
Media MARC source
rdamedia
Media type code
  • c
http://library.link/vocab/ext/overdrive/overdriveId
cl0500000277
Specific material designation
remote
System control number
(OCoLC)827208448

Library Locations

    • Ellis LibraryBorrow it
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      38.944491 -92.326012
    • Engineering Library & Technology CommonsBorrow it
      W2001 Lafferre Hall, Columbia, MO, 65211, US
      38.946102 -92.330125
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